Supply suits ion implanter manufacturers

HiTek Power has introduced a dual 5kV/60kV rack-mounted power supply for ion implantation applications. This approach keeps costs low while meeting the demanding requirements of ion implanter manufacturers in the USA and Japan. For example, the system offers superior ripple and noise performance at output levels below 5kV, together with a full range of remote monitoring and control functions.

The 5kV section has a continuously variable output voltage from 250V to 5kV and is intended for shallow implants.

Output current is between 0 and 200mA and load regulation is better than 5V for a 0 to100% change in current.

Ripple is less than 5V peak-peak and recovery time is better than 500ms to within 0.1% of set voltage.

The 60kV section is intended for deeper implants and offers a continuously variable output voltage between 5kV and 60kV.

Output current is between 0 and 100mA and load regulation is better than 0.05% deviation in output voltage for a 10 to 60mA change in load current at 60kV, increasing to 0.3% at 5kV.

Ripple is less than 60V peak-peak at 60kV and recovery time is better than 500ms to within 0.1% of the previous operating level.